Официальная информация
ООО «Мега СМ»
ИНН 7735029739, КПП 773501001Юридический и почтовый адрес: 124482, г.Москва, Зеленоград, корп. 316, пом. 236
Фактический адрес: 124489, г.Москва, Зеленоград, Панфиловский проспект, 10c1
Свидетельство о постановке на налоговый учет (в pdf)
Свидетельство о присвоении ОГРН (в pdf)
Расчетный счет 40702810122000018271 в АКБ «Абсолют Банк» (ПАО), г.Москва
БИК 044525976, кор./счет 30101810500000000976,
ОГРН 1027739878650, ОКПО 52692510, ОКВЭД 73.10, ОКАТО 45272585000
ОКТМО 45377000, ОКВЭД2 72.19
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Сайт: epitaxy.ru
ООО «МегаКЛАССИК»
ИНН 7735569815, КПП 773501001Юридический и почтовый адрес: 124482, г.Москва, Зеленоград, корп. 316, пом. 236
Фактический адрес: 124489, г.Москва, Зеленоград, Панфиловский проспект, 10c1
Свидетельство о постановке на налоговый учет (в pdf)
Свидетельство о государственной регистрации (в pdf)
Расчетный счет 40702810922000024504 в АКБ «Абсолют Банк» (ПАО), г. Москва,
БИК 044525976, кор./счет 30101810500000000976,
ОГРН 1107746467091, ОКПО 66802215, ОКВЭД 73.10
ОКТМО 45377000, ОКВЭД2 72.19, 24.45.9, ОКПД2 24.45.30.280
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ООО «Мега Эпитех»
ИНН 4027079630, КПП 402701001Юридический и фактический адрес: 248033, г. Калуга, 2-й Академический проезд, д.25, этаж 1, офис 3
Свидетельство о постановке на налоговый учет (в pdf)
Свидетельство о присвоении ОГРН (в pdf)
Банк: КАЛУЖСКОЕ ОТДЕЛЕНИЕ N8608 ПАО СБЕРБАНК г.КАЛУГА
БИК 042908612, кор./счет 30101810100000000612,
ОГРН 1074027004061, ОКВЭД 32.10.5
Тел: (4842) 500-591, факс: (4842) 500-593;
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Сайт: epitaxy.ru
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Партнеры
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Contacts Information
"MeGa SM" - gallium and substrates for epitaxy
Zelenograd, Moscow, Russia, 124489
Fax: +7-495- 981-81-94
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"MeGa Epitech" - epitaxial wafers for IR and red LED's, heterostructure PCHS for NEA-photocatodes
"Argal" - epitaxial wafers for power electronics devices
3 Akademicheski proezd, 19
Kaluga, Russia, 248033
Phone: +7-484-250-05-91;
Phone/Fax: +7-484-250-05-93
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THE “MeGa SM” ,“MeGa Epitech”& "Argal" COMPANIES GROUP HISTORY
November of 2012
We start mass production of p-i-n GaAs structures for power electronics.
May of 2012
Development of heterostructures for 950 nm wavelength emitters under order of West European LED’s manufacturers has been fulfilled.
March of 2012
Development of laboratory growth method for GaAs p-i-n structures manufacturing has been fulfilled. GaAs structures for power electronics p-i-n diodes are delivered to customers
January of 2011
Development of GaAs structures for power electronics p-i-n diodes has been started
July of 2009
LPE growth furnaces of companies Group are consolidated on the production area of “MeGa Epitech” Co Ltd. in Kaluga city.
December of 2008
“MeGa Epitech” Co Ltd. has fulfilled the innovative project “The development of technology and launch of epitaxial heterostructures Ø50 mm for IR range emitters by LPE”. It is the start of the double-double heterostructures for IR range emitters volume production
August of 2008
We start the export shipments of heterostructures to West European LED’s manufacturers
October of 2007
The firm Group area of activity has been divided. “MeGa SM” Co Ltd. focuses its activity on manufacture of semiconductor materials substrates and pure metals and “MeGa Epitech” Co Ltd. focuses its activity on manufacture of GaAlAs heterostructures.
May of 2007
“MeGa Epitech” Co Ltd. has been created. This firm is focused on manufacture of GaAlAs heterostructures by LPE
October of 2004
Volume production of heterostructures for III+ Gen. night vision devices NEA photocathodes has been started. This line of activity has the high priority in production schedule
November of 2001
Heterostructures with 870 nm wave length emission has been put into high volume production. Range of manufactured materials for IR light emitters will be expanding all the time from this moment
May of 2001
Manufacture of heterostructures with emission in the range of 650-660 nm has been started
March of 2000
“MeGa SM” Co Ltd. has been created
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Main Page
The group of companies «Меgа SM» (Moscow) and «Меgа Epitech»&"Argal" (Kaluga) is one of the leading Russian optoelectronic material producers. We are engaged in development and production of emitting and photosensitive AlGaAs heterostructures and p-i-n GaAs structures for power electronics devices by means of liquid phase epitaxy method (LPE).
There are four main challenges of the group of companies:
AlGaAs wafer production for emitting devices of IR range 680-870nm and red range 650-660nm
p-i-n GaAs wafer production for power electronics devices.
processing and high purity gallium recovery both for the needs of epitaxial process itself and for outside customers.
The presented sections of this site contain the brief information on our enterprise and the range of manufactured items.
If you fail to find the materials that may be attractive to you in the catalogue, probably, we’ll be able to make them for you if you place us your order.
To receive more detailed information on the items produced by our company and information on other issues, please, contact us by any means which may be convenient to you.
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